Compiled from: United States Patent and Trademark Office (USPTO)
Patents listed in FTI April/May 2021 issue include:
Chemical Mechanical Polishing Retaining Ring with Integrated Sensor
United States Patent 10,946,496 – Issued March 16, 2021
Inventor: Simon Yavelberg, Cupertino, CA, USA
Assignee: Applied Materials, Inc., Santa Clara, CA, USA
A retaining ring for a chemical mechanical polishing carrier head having a mounting surface for a substrate is provided herein. In some embodiments, the retaining ring may include an annular body have a central opening, a channel formed in the body, wherein a first end of the channel is proximate the central opening, and a sensor disposed within the channel and proximate the first end, wherein the sensor is configured to detect acoustic and/or vibration emissions from processes performed on the substrate.